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Element 1: Silicon
Structure: Films
Origin: Chemical Synthesis
PPMD: 4  nm
Added to NIL: 8/17/2005 10:15:00 AM
Contributor: Anna   Fontbberta i Morral  ,   California Institute of Technology (Caltech) 


Related Website:
http://daedalus.caltech.edu/~annafm/ResearchInterests.htm 

Research Abstract:
In a standard PECVD, a RadioFrequency discharge is used to produce a plasma and decompose the gases that are injected between the electrodes. The radicals and ions formed as a result of the discharge stick on every wall of the chamber, but also on a substrate. Thats how a film is grown. By changing more info

Related Publications:
4. C.S Cojocaru, J.M. Padovani, T. Wade, C. Mandoli, G. Jaskierowicz, J.E. Wegrowe, A. Fontcuberta i Morral, D. Pribat, Conformal horizontal Anodic Oxidation of Aluminum Thin Films, accepted in Nanoletters (2005) pdf 7. A. Fontcuberta i Morral, P. Roca i Cabarrocas, C. Clerc, 'Structure and hydrogen content of polymorphous silicon thin films studied by spectroscopic ellipsometry and nuclear measurements', Phys. Rev. B 69, 125307 (2004) pdf 9. P. Roca i Cabarrocas, A. Fontcuberta i Morral, B. more info
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