In a standard PECVD, a RadioFrequency discharge is used to produce a plasma and decompose the gases that are injected between the electrodes. The radicals and ions formed as a result of the discharge stick on every wall of the chamber, but also on a substrate. Thats how a film is grown. By changing
4. C.S Cojocaru, J.M. Padovani, T. Wade, C. Mandoli, G. Jaskierowicz, J.E. Wegrowe, A. Fontcuberta i Morral, D. Pribat, Conformal horizontal Anodic Oxidation of Aluminum Thin Films, accepted in Nanoletters (2005) pdf 7. A. Fontcuberta i Morral, P. Roca i Cabarrocas, C. Clerc, 'Structure and hydrogen content of polymorphous silicon thin films studied by spectroscopic ellipsometry and nuclear measurements', Phys. Rev. B 69, 125307 (2004) pdf 9. P. Roca i Cabarrocas, A. Fontcuberta i Morral, B.